PVD sputtering - detail

Coatings are typically used to add technical and / or decorative value to products.

The PVD Sputtering process allows for an almost unlimited production of technical coatings on any type of surface to create new materials that are stronger, lighter, cleaner and more economical.

PVD Sputtering coating is one of the most flexible methods to physically deposit the "PVD" (Physical Vapor Deposition) vapor.
The coating material is inserted into the vacuum chamber as a cathode in the form of a metal plate. After the chamber has been emptied, the process gas is introduced (argon is normally used due to its high atomic weight) and then a plasma is generated. Plasma formed by positive argon ions undergoes an acceleration process on the negative cathode which expels atoms from the metal plate (evaporating material). The impact of the ions on the evaporating material produce "Sputtering", as a result of the acceleration given by the incoming particle. Then the objects present in the chamber are coated by the consequent Sputtering of the evaporating material.

Unlike many other vacuum deposition techniques, there is no fusion of material, so all metals and alloys can be deposited with high efficiency and high control.
If, in addition to the process gas, a reactive gas such as nitrogen or acetylene is introduced into the chamber, the reactive carbide nitride develops on the substrates. It is possible to change the combination of the individual layers by varying the combination of reactive gases. Several cathodes made of different materials can be inserted into a vacuum coating system and thus multilayer systems can be produced.

As regards Sputtering coatings with "metallic effect", having high abrasion resistance and high chemical resistance, sputtering depositions of Chromium and Stainless Steel, or carbides and nitrides of transition metals (for example Titanium and Zirconium) are produced.

Sputtering allows to obtain innovative technical coatings with colors for decorative motifs to be applied on the surface of high quality consumer goods with high characteristics of hardness and abrasion resistance.
In addition to being the cleanest technology of any other coating technique, Sputtering provides a combination of benefits that is unmatched; is a cost-effective manufacturing method that generates the thinnest and most uniform coating possible.

It is a low temperature dry process.

It builds an indestructible bond between the film and the substrate as it welds them together at the molecular level. It offers great versatility compared to other coatings because, being a cold transfer, it can be used to deposit conductive or insulating materials on any type of substrate, including metals, ceramics and temperature sensitive plastics. Furthermore, the process has an automatic repeatable deposition control.

KOLZER designs, engineers and manufactures its systems using magnetron sputtering sources of any shape and size (circular, cylindrical, rectangular) providing a wide range of targets (evaporating materials).

MACHINES

Built using the best materials and components available on the world market, KOLZER sputtering machines are available in horizontal and vertical versions. Both configurations feature robust steel process chambers of various sizes.

We are a reference company in the sector. We offer high quality products born from the synergy between over 70 years of experience and passion. And it is precisely the love for what we do that allows us to always offer innovation and competitive prices.

Our commitment is concentrated in making it easy to use technologically complex production systems that are flexible and multipurpose, designed with you for you, customized to meet your needs.

Our offer consists of a complete range of systems. From the "compact mini-machine" for companies and research laboratories, to elaborate systems for in-line processes, up to HYBRID systems, i.e. thermal evaporation, sputtering and plasma combined in a single machine, in order to facilitate the user's needs and offer maximum flexibility of use.

DGK^® horizontal series

An experimental development by KOLZER engineers, led to the creation of this machine with reduced production space in the company but extremely productive. It can generate any Technical PVD and coat any plastic, zamak, steel and glass material if necessary. The machine can also create a transparent protective layer in the same deposition cycle to further improve the chemical performance!

CAPACITY

PVD. DGK Machine can install up to 4 Pulsed Sputtering Sources and the vacuum is achieved in 4 minutes. The activation of the PLASMA Ultra ability accelerates the preparation before deposition making the machine with super fast cycle. While it is in vacuum, the machine can launch a powerful atomization of the metals that creates an impact zone by dense coating of any shape or geometry of the piece and applies to them the uniform covering effect.

Here is our standard series *, the most complete on international markets, sorted by process chamber size:

KOLZER DGK24" Coating Area 600 mm
KOLZER DGK36" Coating Area 1000 mm
KOLZER DGK48" Coating Area 1200 mm
KOLZER DGK63" Coating Area 1600 mm
(* Other size always available on request )

TIMES and COSTS. For the duration of the process, it is always linked to the type of performance to be achieved. The facilitated price entry provides any type of company to have a PVD machine in house. #engineers #pvd #sputtering #vacuumcoating #development #kolzer

MK^® vertical series

The innovative vertical range KOLZER MK® offers high process speed, large production volumes, easy loading / unloading thanks to the two doors that equip the machine systems.

The range of standard implants * of the MK family consists of:
MK34" Coating Area 1000 mm
MK63" Coating Area 1.600 mm
(* Other formats always available on demand)

A tailor-made design service for machines of specific and customized dimensions to optimize the user's processes completes the horizontal and vertical ranges of KOLZER. All systems can be assisted by loading systems, including automatic ones, developed to maximize production.

The experience gained by KOLZER today allows us to produce systems capable of operating in the shortest possible time, with easy use and a fully automatic process control system that eliminates operator errors.

Regardless of the use of the technique in the various sectors, with KOLZER the customer receives everything from a single source: from the optimal solution for your needs, to consultancy, planning and adequate training up to customized plant engineering.

"Profitability and Quality for the customer" are of primary importance for us.

Why a KOLZER Sputtering System?

• Over 1200 systems installed all over the world
• Certified cycle times, the fastest on the market
• Massive production while maintaining low energy and consumable consumption
• Great service efficiency given the ease of loading / unloading and low maintenance
• High productivity with a single operator
• Windows operating system with 24/7 internet connection
• Steel process chambers, designed and built to last over time
• Totally "Eco-friendly" processes
• Space-saving design
• Plasma, PECVD and PVD Sputtering processes available on all plants
• PVD Sputtering HIPIMS, DUAL Magnetron, circular and planar cathodes
• 2 years warranty and 12 years minimum guaranteed working life
• Global network of consultancy, assistance and punctual after-sales service

The low management costs, the fastest cycle times currently available on the global market ensure KOLZER machines the highest industrial standards, at the most competitive costs.